High-k Gate Dielectrics for CMOS Technology / Gang He (u. a.) / Buch / Englisch / 2012 / Wiley-VCH / EAN 9783527330324 - gebunden oder broschiert
2012, ISBN: 9783527330324
[ED: Gebunden], [PU: Wiley-VCH], Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of… Mehr…
booklooker.de |
High-k Gate Dielectrics for CMOS Technology / Gang He (u. a.) / Buch / Englisch / 2012 / Wiley-VCH / EAN 9783527330324 - gebunden oder broschiert
2012, ISBN: 9783527330324
[ED: Gebunden], [PU: Wiley-VCH], Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of… Mehr…
booklooker.de |
2012, ISBN: 9783527330324
Hard cover, 100% Money Back Guarantee. Brand New, Perfect Condition. We offer expedited shipping to all US locations. Over 3, 000, 000 happy customers., Fine., 590 p. Intended for profess… Mehr…
alibris.co.uk |
2012, ISBN: 3527330321
[EAN: 9783527330324], Neubuch, [PU: John Wiley and Sons], Brand New, Books
AbeBooks.de |
2012, ISBN: 9783527330324
Hard cover, Neubuch, [PU: Blackwell Verlag GmbH]
alibris.co.uk |
High-k Gate Dielectrics for CMOS Technology / Gang He (u. a.) / Buch / Englisch / 2012 / Wiley-VCH / EAN 9783527330324 - gebunden oder broschiert
2012, ISBN: 9783527330324
[ED: Gebunden], [PU: Wiley-VCH], Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of… Mehr…
He, Gang:
High-k Gate Dielectrics for CMOS Technology / Gang He (u. a.) / Buch / Englisch / 2012 / Wiley-VCH / EAN 9783527330324 - gebunden oder broschiert2012, ISBN: 9783527330324
[ED: Gebunden], [PU: Wiley-VCH], Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of… Mehr…
2012
ISBN: 9783527330324
Hard cover, 100% Money Back Guarantee. Brand New, Perfect Condition. We offer expedited shipping to all US locations. Over 3, 000, 000 happy customers., Fine., 590 p. Intended for profess… Mehr…
2012, ISBN: 3527330321
[EAN: 9783527330324], Neubuch, [PU: John Wiley and Sons], Brand New, Books
2012, ISBN: 9783527330324
Hard cover, Neubuch, [PU: Blackwell Verlag GmbH]
Bibliographische Daten des bestpassenden Buches
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Detailangaben zum Buch - High-k Gate Dielectrics for CMOS Technology
EAN (ISBN-13): 9783527330324
ISBN (ISBN-10): 3527330321
Gebundene Ausgabe
Erscheinungsjahr: 2012
Herausgeber: Wiley-VCH
557 Seiten
Gewicht: 1,247 kg
Sprache: Englisch
Buch in der Datenbank seit 2009-08-21T06:10:01+02:00 (Vienna)
Detailseite zuletzt geändert am 2023-10-19T16:52:52+02:00 (Vienna)
ISBN/EAN: 3527330321
ISBN - alternative Schreibweisen:
3-527-33032-1, 978-3-527-33032-4
Alternative Schreibweisen und verwandte Suchbegriffe:
Autor des Buches: sun, gäng, viewpoint
Titel des Buches: high tech, gate, dielectrics, gang
Daten vom Verlag:
Autor/in: Gang He; Zhaoqi Sun
Titel: High-k Gate Dielectrics for CMOS Technology
Verlag: Wiley-VCH; Wiley-VCH
558 Seiten
Erscheinungsjahr: 2012-08-22
Gedruckt / Hergestellt in Singapur.
Gewicht: 1,240 kg
Sprache: Englisch
199,00 € (DE)
204,60 € (AT)
Available
170mm x 240mm x 32mm
BB; Hardcover, Softcover / Chemie/Sonstiges; Nanowissenschaften; Verstehen; Chemie; CMOS; Components & Devices; Dielektrikum; Electrical & Electronics Engineering; Elektrotechnik u. Elektronik; Halbleiterphysik; Komponenten u. Bauelemente; MEMS; Nanomaterial; Nanomaterialien; Nanomaterials; Nanostrukturiertes Material; Nanotechnologie; Nanotechnology; Physics; Physik; Semiconductor Physics; MEMS; Komponenten u. Bauelemente; Nanomaterialien; Halbleiterphysik; Nanotechnologie
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.Weitere, andere Bücher, die diesem Buch sehr ähnlich sein könnten:
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9783527646371 High-k Gate Dielectrics for CMOS Technology (Wiley-VCH)
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