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Ion Implantation And Synthesis Of Materials - M. Nastasi
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
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M. Nastasi:
Ion Implantation And Synthesis Of Materials - Taschenbuch

2010, ISBN: 3642062598

Paperback, [EAN: 9783642062599], Springer, Springer, Book, [PU: Springer], 2010-11-09, Springer, Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described., 278020, Physical Chemistry, 278004, Chemistry, 57, Science & Nature, 1025612, Subjects, 266239, Books, 278161, Applied Optics, 278160, Electronics Engineering, 278141, Electronics & Communications Engineering, 278115, Engineering & Technology, 57, Science & Nature, 1025612, Subjects, 266239, Books, 922390, Engineering Physics, 278115, Engineering & Technology, 57, Science & Nature, 1025612, Subjects, 266239, Books, 278433, Light, Optics & Laser, 278409, Physics, 57, Science & Nature, 1025612, Subjects, 266239, Books, 278432, Nuclear, 278409, Physics, 57, Science & Nature, 1025612, Subjects, 266239, Books, 278434, Particle & High-Energy Physics, 278409, Physics, 57, Science & Nature, 1025612, Subjects, 266239, Books, 278443, States of Matter, 278409, Physics, 57, Science & Nature, 1025612, Subjects, 266239, Books, 922952, Physics, 277889, Cosmology, 278439, Relativity, 922868, Popular Science, 57, Science & Nature, 1025612, Subjects, 266239, Books, 571046, Electronics & Telecommunications Engineering, 564346, Engineering, 564334, Scientific, Technical & Medical, 1025612, Subjects, 266239, Books, 570994, Particle Physics, 564354, Physics, 564334, Scientific, Technical & Medical, 1025612, Subjects, 266239, Books

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Ion Implantation and Synthesis of Materials - James W. Mayer
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James W. Mayer:
Ion Implantation and Synthesis of Materials - Taschenbuch

2010, ISBN: 3642062598

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[EAN: 9783642062599], Neubuch, [PU: Springer Feb 2010], This item is printed on demand - Print on Demand Neuware - Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described. 280 pp. Englisch

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2006, ISBN: 9783642062599

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Ion Implantation and Synthesis of Materials:Softcover reprint of hardcover 1st ed. 2006. James W. Mayer, Michael Nastasi Ion Implantation and Synthesis of Materials:Softcover reprint of hardcover 1st ed. 2006. James W. Mayer, Michael Nastasi Bücher > Wissenschaft > Physik, Springer

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Softcover reprint of hardcover 1st ed. 2006. Softcover reprint of hardcover 1st ed. 2006. Bücher > Wissenschaft > Physik, [PU: Springer, Berlin/Heidelberg/New York, NY]

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Ion Implantation and Synthesis of Materials - Taschenbuch

2010, ISBN: 9783642062599

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Details zum Buch
Ion Implantation and Synthesis of Materials
Autor:

Nastasi, Michael; Mayer, James W.

Titel:

Ion Implantation and Synthesis of Materials

ISBN-Nummer:

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Detailangaben zum Buch - Ion Implantation and Synthesis of Materials


EAN (ISBN-13): 9783642062599
ISBN (ISBN-10): 3642062598
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2010
Herausgeber: Springer-Verlag GmbH
280 Seiten
Gewicht: 0,427 kg
Sprache: eng/Englisch

Buch in der Datenbank seit 18.05.2011 00:41:30
Buch zuletzt gefunden am 28.04.2017 14:38:39
ISBN/EAN: 9783642062599

ISBN - alternative Schreibweisen:
3-642-06259-8, 978-3-642-06259-9


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