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Shallow tempering of materials - Mehboob Sadiq
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Shallow tempering of materials - neues Buch

2010, ISBN: 9783838389455

ID: 701260683

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Bücher > Fremdsprachige Bücher > Englische Bücher Taschenbuch 30.07.2010 Buch (fremdspr.), LAP Lambert Academic Publishing, .201

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Shallow tempering of materials - Mehboob Sadiq
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Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 931303cf9767cd292da974e566c7789c

Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Bücher / Fremdsprachige Bücher / Englische Bücher 978-3-8383-8945-5, LAP Lambert Academic Publishing

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Shallow tempering of materials - Mehboob Sadiq
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(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 697302106

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, LAP Lambert Academic Publishing

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Shallow tempering of materials - Mehboob Sadiq
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 104895224

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, LAP Lambert Acad. Publ.

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Sadiq, Mehboob:
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2010, ISBN: 383838945X

Gebundene Ausgabe, ID: 8575617

Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE - Buch, gebundene Ausgabe, 140 S., Beilagen: Paperback, Erschienen: 2010 LAP Lambert Acad. Publ.

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Details zum Buch
Shallow tempering of materials
Autor:

Sadiq, Mehboob

Titel:

Shallow tempering of materials

ISBN-Nummer:

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation.

Detailangaben zum Buch - Shallow tempering of materials


EAN (ISBN-13): 9783838389455
ISBN (ISBN-10): 383838945X
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2010
Herausgeber: LAP Lambert Acad. Publ.
140 Seiten
Gewicht: 0,225 kg
Sprache: eng/Englisch

Buch in der Datenbank seit 15.11.2009 18:24:07
Buch zuletzt gefunden am 02.06.2017 23:30:23
ISBN/EAN: 9783838389455

ISBN - alternative Schreibweisen:
3-8383-8945-X, 978-3-8383-8945-5


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